| Author | C. Gaire, Y. Ou, H. Arao, M. Egami, A. Nakashima, R. C. Picu, G.-C. Wang, and T.-M. Lu |
|---|---|
| Title | Evaluation of mechanical properties of porous methyl silsesquioxane and nanoclustering silica films using atomic force microscope |
| Year | 2010 |
| Journal | Journal of Porous Materials |
| Volume | 17 |
| Pages | 11-18 |
| Abstract | Mechanical properties of porous methyl silsesquioxane samples with dielectric constant 2.4 and 2.0 and a recently developed nanoclustering silica film samples with dielectric constants 2.3 and 2.0 were evaluated using an atomic force microscope based nanoindentation. It was found that the Young’s modulus and the hardness decrease while the fracture toughness increases with a decrease in the dielectric constant in the same type of material. Moreover, the Young’s modulus and the hardness of the nanoclustering silica films were observed to be at least twice and fracture toughness values ~1.3–1.5 higher than those for methyl silsesquioxane films with similar dielectric constants. The high resolution topographic imaging capability of atomic force microscope was shown to be particularly useful in the measurement of cracks generated by the ultra-low indentation loads, and the evaluation of the fracture toughness of the nanoscale volumes of materials. |
| DOI Link | 10.1007/s10934-008-9259-y |