| Author | D. F. Richards, M. O. Bloomfield, S. Soukane and T. S. Cale |
|---|---|
| Title | Applications of Plasma Processes in Microelectronics |
| Year | 1999 |
| Pages | - - |
| Editor | - - |
| Abstract | Selected applications of plasma processes in deposition and etch operations used during the fabrication of integrated circuits are discussed. The focus is on the modeling and simulation of topography evolution during these processes. |